Minimization of phase errors in long fiber Bragg grating phase masks made using electron beam lithography

IEEE Photonics Technology Letters

Volumn 8, Issue 10, 1996, Pages 1334-1336

  Albert, J ^a   Theriault S ^a   Bilodeau, F ^a   Johnson, D C ^a   Hill, K O ^a   Sixt, P ^b   Rooks, M J ^c  

^a Industry Canada   (Canada)

^b PHOTRONICS SA   (Switzerland)

^c Department of Theoretical and Applied Mechanics and the Cornell Nanofabrication Facility   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ERRORS; FABRICATION; INTERFEROMETERS; LIGHT REFLECTION; MASKS; OPTICAL FIBERS; OPTICAL VARIABLES MEASUREMENT; PHASE SHIFT; REFRACTIVE INDEX;

FIBER BRAGG GRATING; PHASE ERRORS; PHASE ERRORS MINIMIZATION; PHASE MASKS; STAGE RUNOUT ERROR;

DIFFRACTION GRATINGS;

EID: 0030271082     PISSN: 10411135     EISSN: None     Source Type: Journal    
DOI: 10.1109/68.536646     Document Type: Article

References (6)

1. K. O. Hill, B. Malo, F. Bilodeau, D. C. Johnson, and J. Albert, "Bragg gratings fabricated in monomode photosensitive optical fiber by UV exposure through a phase mask," Appl. Phys. Lett., vol. 62, pp. 1035-1037, 1993.
2. H. G. Bruckner, O. Leminger, R. Zengerle, and M. Korn, "Performance of electron beam written dielectric waveguide grating filters considering fabrication tolerances," J. Opt. Commun., vol. 14, pp. 18-24, 1993.
3. S. Thériault, F. Bilodeau, B. Malo, D. C. Johnson, J. Albert, K. O. Hill, and L. E. Erickson, "Effect of phase mask stitching errors on the spectral response of uniform and apodized fiber Bragg grating," Proc. 1995 IEEE Lasers and Electro-Opti. Soc. Anna. Meet., vol. 2, 1995, pp. 77-78.
4. M. J. Rooks, R. C. Tiberio, M. Chapman, T. Hammond, E. Smith, A. Lenef, R. Rubenstein, D. Pritchard, S. Adams, J. Ferrera, J. M. Carter, and H. I. Smith, Coherence and structural design of free-standing gratings for atom-wave optics, Jpn. J. Appl. Phys., vol. 34, pp. 6935-6939, 1995.
5. B. Malo, J. Albert, K. O. Hill, F. Bilodeau, D. C. Johnson, and S. Thriault, "Enhanced photosensitivity in lightly doped standard telecommunication fiber exposed to high fluence ArF excimer laser light," Electron. Lett., vol. 31, pp. 879-880, 1995.
6. R. C. Tiberio, P. F. Chapman, R. D. Martin, S. Forouhar, and R. J. Lang, "Laterally coupled distributed feedback laser fabricated with electron-beam lithography and chemically assisted ion-beam etching," J. Vac. Sci. Technol., vol. B12, pp. 3746-3749, 1994.