One-level gray-tone lithography - Mask data preparation and pattern transfer

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2783, Issue , 1996, Pages 71-79

  Reimer, K ^a   Quenzer, H J ^a   Demmeler, R ^a   Wagner, B ^a  

^a FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT   (Germany)

Author keywords

Lithography; Microfabrication; Microoptics; Microsystems; Resists; Surfacetopography

Indexed keywords

DRY ETCHING; LITHOGRAPHY; MASKS; MICROFABRICATION; MICROOPTICS; MICROSYSTEMS; PHOTORESISTS; SURFACE TOPOGRAPHY;

DESIGN REPRESENTATION; DRY ETCHING PROCESS; ELECTRONICS COMPONENTS; FABRICATION PROCESS; GRAY-TONE LITHOGRAPHY; PATTERN TRANSFERS; RESISTS; SUBSTRATE MATERIAL;

OPTICAL INSTRUMENTS;

EID: 12844257862     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.248506     Document Type: Conference Paper

References (9)

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