Dependence of surface smoothing, sputtering and etching phenomena on cluster ion dosage

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 196, Issue 3-4, 2002, Pages 268-274

  Song, Jae Hoon ^a   Choi, Duck Kyun ^b   Choi, Won Kook ^a  

^a Korea Institute of Science and Technology   (South Korea)

^b Hanyang University   (South Korea)

Author keywords

Cluster ion impact; Hillocks; Sputtering; Surface embossment; Surface migration; Surface smoothing

Indexed keywords

ETCHING; HARDNESS; IRRADIATION; SPUTTERING; SURFACE STRUCTURE;

SURFACE SMOOTHING;

ION BEAMS;

EID: 0036850443     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(02)01295-8     Document Type: Article

References (17)

1. Yamada I. Mater. Sci. Eng. A. 217/218:1996;82.
2. Goto K.-I., Matsuo J., Tada Y., Sugii T., Yamada I. IEEE Trans. Electron Dev. 46:1999;683.
3. Gspann J. Nucl. Instr. and Meth. B. 112:1996;86.
4. Beuhler R., Friedman L. Chem. Rev. 86:1986;521.
5. Sigmund P. J. Phys. 50:1989;175.
6. Gspann J. From Clusters to Crystals. Vol. 2:1992;115 Kluwer, Dordrecht.
7. Gspann J. Similarities and Differences between Atomic Nuclei and Clusters. 1998;299 American Institute of Physics.
8. Seki T., Kaneko T., Takeuchi D., Aoki T., Matsuo J., Insepov Z., Yamada I. Nucl. Instr. and Meth. B. 121:1997;498.
9. Toyoda N., Hagiwara N., Matsuo J., Yamada I. Nucl. Instr. and Meth. B. 161-163:2000;980.
10. Song J.-H., Kwon S.N., Choi D.-K., Choi W.-K. Nucl. Instr. and Meth. B. 179:2001;568.
11. Aoki T., Seki T., Matsuo J., Insepov Z., Yamada I. Nucl. Instr. and Meth. B. 153:1999;264.
12. Takeuchi D., Fukushima K., Matsuo J., Yamada I. Nucl. Instr. and Meth. B. 121:1997;493.
13. Takeuchi D., Seki T., Aoki T., Matsuo J., Yamada I. Chem. Phys. 54:1998;76.
14. Bhushan B., Li X. J. Mater. Res. 12(1):1997;54.
15. B. Bhushan, Nanotribology and nanomechanics of MEMS devices, in: Proceedings of Ninth International Workshop on Micro Electromechanical Systems, IEEE, Sandiego, California, 1996, p. 97.
16. Sjöström H., Ivanov I., Johonsson M., Hultman L., Sundgren J.-H., Hainsworth S.V., Page T.F., Wallenberg L.R. Thin Solid Films. 246:1994;103.
17. Gruber A., Gspann J. J. Vac. Sci. Technol. B. 15:1997;2362.