Thin film oxides as probe for homogeneity measurements of 3-dimensional objects treated by plasma immersion ion implantation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 166, Issue , 2000, Pages 154-158

  Ensinger, W ^a   Volz, K ^a  

^a PHILIPPS UNIVERSITY MARBURG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; ION BOMBARDMENT; NIOBIUM COMPOUNDS; OXIDES; PLASMA ETCHING; RADIATION EFFECTS; SPUTTERING; TANTALUM COMPOUNDS; THIN FILMS; TITANIUM OXIDES;

NIOBIUM OXIDE; PLASMA IMMERSION ION IMPLANTATION (PIII); SPUTTER ETCHING; TANTALUM OXIDE;

ION IMPLANTATION;

EID: 0033728869     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)00739-9     Document Type: Article

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