Fast deposition of microcrystalline silicon films with preferred (2 2 0) crystallographic texture using the high-density microwave plasma

Solar Energy Materials and Solar Cells

Volumn 74, Issue 1-4, 2002, Pages 505-511

  Yoshino, Koichi ^a   Ohkawara, Go ^a   Ueyama, Hiroyuki ^b   Shirai, Hajime ^a  

^a SAITAMA UNIVERSITY   (Japan)

^b Nihon Koshuha Co Ltd   (Japan)

Author keywords

c Si:H; Fast deposition; High density plasma; Spoke antenna

Indexed keywords

CRYSTAL DEFECTS; CRYSTAL ORIENTATION; CRYSTALLINE MATERIALS; CRYSTALLOGRAPHY; DEPOSITION; EMISSION SPECTROSCOPY; MICROWAVES; PLASMA DIAGNOSTICS; SEMICONDUCTING FILMS; TEXTURES;

HIGH DENSITY MICROWAVE PLASMAS;

SILICON SOLAR CELLS;

EID: 0036778636     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(02)00066-1     Document Type: Article

References (10)