Effect of deposition interruption and substrate bias on the structure of sputter-deposited yttria-stabilized zirconia thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 20, Issue 5, 2002, Pages 1744-1748

  Ruddell, David E ^a   Stoner, Brian R ^a,b   Thompson, Jeffrey Y ^a  

^a UNIVERSITY OF NORTH CAROLINA   (United States)

^b MCNC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; MAGNETRON SPUTTERING; SPUTTER DEPOSITION; SUBSTRATES; X RAY DIFFRACTION ANALYSIS; YTTRIUM; ZIRCONIA;

COLUMNAR GRAIN STRUCTURE;

THIN FILMS;

EID: 0036749621     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1501573     Document Type: Article

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