Deposition of highly adhesive amorphous carbon films with the use of preliminary plasma-immersion ion implantation

Surface and Coatings Technology

Volumn 156, Issue 1-3, 2002, Pages 311-316

  Bugaev, S P ^a   Oskomov, K V ^a   Sochugov, N S ^a  

^a INSTITUTE OF HIGH CURRENT ELECTRONICS   (Russian Federation)

Author keywords

a C:H; Adhesion; Plasma immersion ion implantation (PIII); Plasma immersion ion assisted deposition (PIID)

Indexed keywords

ADHESION; CARBON; ION IMPLANTATION; IONIZATION; THIN FILMS;

GROWTH RATE;

COATING TECHNIQUES;

CARBON;

ION IMPLANTATION;

ADHESION; ATOM; DRY DEPOSITION; ELECTRIC POTENTIAL; FILM; GAS; IONIZATION; MATERIAL COATING; PLASMA (IONIZED GAS); PLASMA IMMERSION ION IMPLANTATION METHOD;

EID: 0036641902     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00099-3     Document Type: Article

References (20)