Hall current accelerator for pre-treatment of large area glass sheets

Thin Solid Films

Volumn 351, Issue 1-2, 1999, Pages 190-193

  Vershinin, N ^a,b   Straumal, B ^b,c   Filonov, K ^a   Dimitriou, R ^b   Gust, W ^c   Benmalek, M ^d  

^a SONG Ltd   (Russian Federation)

^b INSTITUTE OF SOLID STATE PHYSICS   (Russian Federation)

^c UNIVERSITY OF STUTTGART   (Germany)

^d ALCAN INTERNATIONAL LIMITED   (Canada)

Author keywords

Aluminum; Glass; Plasma processing; Polymers; Sputtering

Indexed keywords

ALUMINUM; CURRENT DENSITY; FUSED SILICA; GLASS; MICROHARDNESS; POLYMETHYL METHACRYLATES; SPUTTERING; SURFACE ROUGHNESS; VACUUM DEPOSITED COATINGS;

GLASS SHEETS; HALL CURRENT ACCELERATOR; ION CURRENT DENSITY; SPUTTER CLEANING; VACUUM ARC DEPOSITION;

SURFACE CLEANING;

EID: 0033170214     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00250-3     Document Type: Article

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