SCOPUS 정보 검색 플랫폼

Volumn 136, Issue 1-3, 2001, Pages 23-27

Development of hybrid pulse plasma coating system

(10) Sakudo, N a Awazu, K b Yasui, H c Saji, E d Okazaki, K e Hasegawa, Y f Ikenaga, N g Kanda, K h Nambo, Y i Saitoh, K j

a KANAZAWA INSTITUTE OF TECHNOLOGY (Japan)

b Hokuriku Indust Advancement Center (Japan)

c INDUSTRIAL RESEARCH INSTITUTE OF ISHIKAWA (Japan)

d INDUSTRIAL TECHNOLOGY CENTER OF FUKUI PREFECTURE (Japan)

e Fujita Giken Co Ltd (Japan)

f Onward Ceramic Coating Co Ltd (Japan)

g Shibuya Kogyo Co Ltd (Japan)

h KANAZAWA UNIVERSITY (Japan)

i Nicca Chemical Co Ltd (Japan)

more..

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; ELECTRIC POTENTIAL; ION BEAMS; ION IMPLANTATION; MAGNETIC FIELD EFFECTS; MICROWAVES; PLASMA DENSITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA SOURCES; PULSE GENERATORS;

INDUCTIVELY COUPLED PLASMAS; PLASMA COATINGS; PLASMA-BASED ION IMPLANTATION (PBII);

COATINGS;

COATING PROCESS; PLASMA COATING; PROTECTIVE AGENT; VAPOR;

COATING; CORROSION PROTECTION; ION IMPLANTATION; PLASMA TREATMENT; VAPOR DEPOSITION;

EID: 0035241903 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(00)01003-3 Document Type: Article

Times cited : (7)

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