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Volumn 410, Issue 1-2, 2002, Pages 121-128

Improvement of Ta-based thin film barriers on copper by ion implantation of nitrogen and oxygen

(11) Wieser, E a Peikert, M a Wenzel, C c Schreiber, J b Bartha, J W c Bendjus, B b Melov, V V b Reuther, H a Mucklich A a Adolphi, B c Fischer, D c

a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH (Germany)

b FRAUNHOFER INSTITUTE FOR NON DESTRUCTIVE TESTING (Germany)

c DRESDEN UNIVERSITY OF TECHNOLOGY (Germany)

Author keywords

Diffusion barrier; Ion implantation; Metallization; Tantalum

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; COPPER; CRYSTAL MICROSTRUCTURE; CRYSTALLIZATION; INTERFACES (MATERIALS); ION BOMBARDMENT; ION IMPLANTATION; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; NITROGEN; OXYGEN; POLYCRYSTALLINE MATERIALS; SPUTTER DEPOSITION; TANTALUM; THERMODYNAMIC STABILITY;

EPITAXIAL FILMS;

THIN FILMS;

EID: 0036574150 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(02)00273-0 Document Type: Article

Times cited : (8)

References (18)

1
- 4444230968
- Semiconductor Industry Association
- (2001) International Technology Roadmap for Semiconductors , pp. 5

2
- 0032121606
- (1998) J. Electrochem. Soc. , vol.145 , Issue.7 , pp. 2538
- Wang, M.T.¹ Lin, Y.C.² Chen, M.C.³

3
- 0001042043
- (1990) J. Vacuum Sci. Technol. A , vol.8 , pp. 3796
- Chang, C.A.¹

4
- 0008988230
- (1992) J. Appl. Phys. , vol.71 , pp. 5433
- Holloway, K.¹ Freyer, P.M.² Cabral, C.³ Harper, J.M.E.⁴ Baily, P.J.⁵ Kelleher, K.H.⁶

5
- 36449002563
- (1993) J. Appl. Phys. , vol.73 , pp. 300
- Clevenger, L.A.¹ Bojarczuk, N.A.² Holloway, K.³ Harper, J.M.⁴ Cabral, C.⁵ Schad, R.G.⁶ Cardone, F.⁷ Stolt, L.⁸

6
- 0032482017
- (1998) Thin Solid Films , vol.320 , pp. 141
- Lee, Y.-J.¹ Suh, B.-S.² Rha, S.-K.³ Park, C.-O.⁴

7
- 0032208223
- (1998) Mater. Chem. Phys. , vol.57 , pp. 17
- Lee, C.¹ Shin, Y.-H.²

8
- 0009406872
- M.E. Gross, T. Gessner, N. Kobayashi, Y. Yasuda (Eds.) Materials Research Society, Warrendale, PA
- (1999) Advanced Metallization Conference 1999 (AMC 1999) , pp. 257
- Wieser, E.¹ Schreiber, J.² Wenzel, C.³ Bartha, J.W.⁴ Bendjus, B.⁵ Melov, V.⁶ Peikert, M.⁷ Matz, W.⁸ Adolphi, B.⁹ Fischer, D.¹⁰

9
- 0024714359
- (1989) Mater. Sci. Eng. A , vol.115 , pp. 73
- Raole, P.M.¹ Narsale, A.M.² Kothari, D.C.³ Pawar, P.S.⁴ Gogawale, S.V.⁵ Guzman, L.⁶ Dapor, M.⁷

10
- 0030243014
- (1996) Surf. Coat. Technol. , vol.83 , pp. 109
- Fernandez, A.¹ Caballero, A.² Jimenez, V.³ Sanchez, J.C.⁴ Gonzales-Elipe, A.R.⁵ Alonso, F.⁶ Onate, J.I.⁷

11
- 0001499391
- (1996) Nucl. Instrum. Methods B , vol.108 , pp. 300
- Wang, W.J.¹ Wang, T.M.²

12
- 0008988230
- (1992) J.Appl. Phys. , vol.71 , pp. 5433
- Holloway, K.¹ Freyer, P.M.² Cabral, C.³ Bailey, P.J.⁴ Kelleher, K.H.⁵

13
- 0034262690
- (2000) Thin Solid Films , vol.373 , pp. 64
- Laurila, T.¹ Zeng, K.² Molarius, J.M.T.³ Suni, I.⁴ Kivilathi, J.K.⁵

14
- 0033721452
- (2000) Thin Solid Films , vol.370 , pp. 10
- Moshfegh, A.Z.¹ Akhavan, O.²

15
- 0000899113
- (1991) J. Appl. Phys. , vol.70 , pp. 1369
- Kolawa, E.¹ Chen, J.S.² Reid, J.S.³ Pokela, P.J.⁴ Nicolet, M.A.⁵

16
- 0033352680
- (1999) Thin Solid Films , vol.357 , pp. 237
- Lee, Y.-J.¹ Suh, B.-S.² Park, C.-O.³

17
- 84991413451
- G.S. Sandhu, H. Körner, M. Murakami, Y. Yasuda, N. Kobayashi, (Eds.), Materials Research Society, Warrendale, PA
- (1998) Advanced Metallization Conference 1998 (AMC 1998) , pp. 337
- Fischer, D.¹ Stavrev, M.² Urbansky, N.³ Wenzel, C.⁴ Neubauer, E.⁵ Bauer, J.G.⁶ Scherg, T.⁷ Schulze, H.-J.⁸

18
- 0030212480
- (1996) J. Mater. Sci. , vol.7 , pp. 271
- Jang, S.-Y.¹ Lee, S.-M.² Baik, H.-K.³

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