Fabrication of MEMS devices by using anhydrous HF gas-phase etching with alcoholic vapor

Journal of Micromechanics and Microengineering

Volumn 12, Issue 3, 2002, Pages 297-306

  Jang, Won Ick ^a   Choi, Chang Auck ^a   Lee, Myung Lae ^a   Jun, Chi Hoon ^a   Kim, Youn Tae ^a  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; MICROACTUATORS; MICROMACHINING; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYSILICON; SEMICONDUCTOR DOPING; SILICON ON INSULATOR TECHNOLOGY;

GAS-PHASE ETCHING (GPE);

MICROELECTROMECHANICAL DEVICES;

EID: 0036572963     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/12/3/316     Document Type: Article

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