By an improved drying method

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 1996, Pages 228-233

  Ohtsu, Masato ^a   Minami, Kazuyuki ^a   Esashi, Masayoshi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DRYING; ELECTRODES; ETCHING; ETHERS; FABRICATION; INTERFEROMETERS; SEMICONDUCTING GLASS; SEMICONDUCTING SILICON; SILICON WAFERS; SURFACE TENSION; THIN FILMS;

ANODIC BONDING; ELECTROSTATIC FORCE; FLUORINERT; LASER ASSISTED ETCHING METHOD; SILICON THIN BEAM STRUCTURE;

SENSORS;

EID: 0029754594     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)