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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 6 A, 1999, Pages 3693-3699

Stress characteristics of multilayered polysilicon film for the fabrication of microresonators

(6) Choi, Chang Auck a Lee, Chang Seung a Jang, Won Ick a Hong, Yoon Shik a Lee, Jong Hyun a Sohn, Byung Ki b

a Electronics and Telecommunications Research Institute (ETRI) (South Korea)

b Kyungpook National University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; HEAT TREATMENT; MICROACTUATORS; MICROELECTROMECHANICAL DEVICES; MULTILAYERS; RESONATORS; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING; STRESS ANALYSIS;

LOW PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD) SYSTEMS; MICRORESONATORS; MULTILAYERED POLYSILICON FILMS;

SEMICONDUCTING FILMS;

EID: 0032668278 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.38.3693 Document Type: Article

Times cited : (8)

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