Characterization of damage in electron cyclotron resonance plasma etched compound semiconductors

Applied Surface Science

Volumn 117-118, Issue , 1997, Pages 597-604

  Pearton, S J ^a  

^a University of Florida   (United States)

Author keywords

ECR plasma; Near surface damage; Non stoichiometry

Indexed keywords

CRYSTAL DEFECTS; ELECTRON CYCLOTRON RESONANCE; ION BOMBARDMENT; PLASMA ETCHING; STOICHIOMETRY;

COMPOUND SEMICONDUCTORS;

SEMICONDUCTOR MATERIALS;

EID: 0031548610     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(97)80149-3     Document Type: Article

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