Anisotropic deposition of copper by H-assisted plasma chemical vapor deposition

Materials Science in Semiconductor Processing

Volumn 5, Issue 2-3, 2002, Pages 301-304

  Takenaka, Kosuke ^a   Shiratani, Masaharu ^a   Onishi, Masao ^a   Takeshita, Manabu ^a   Kinoshita, Toshio ^a   Koga, Kazunori ^a   Watanabe, Yukio ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

Anisotropic chemical vapor deposition; Cu; H; Interconnect; Plasma CVD; ULSI

Indexed keywords

ANISOTROPY; ION BOMBARDMENT; METALLIZING; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; ULSI CIRCUITS;

ANISOTROPIC DEPOSITION; INTEGRATED CIRCUIT INTERCONNECTS;

COPPER;

EID: 0036557720     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(02)00108-7     Document Type: Conference Paper

References (12)

1. International Technology Roadmap for Semiconductors, 2000 Roadmap update, by the Semiconductor Industry Association & SEMATECH.
2. Chae Y.K., Komiyama H. J Appl Phys. 90:2001;3610.
3. Cho N.I., Sul Y. Mater Sci Eng B. 72:2000;184.
4. Weiss K., Riedel S., Schulz S.E., Helneder M., Wendt H., Gessner T. Microelectron Eng. 50:2000;433.
5. Kwak S.K., Chung K.S., Park I., Lim H. Current Appl Phys. 2:2002;205.
6. Awaya N., Arita Y. J Appl Phys. 30:1991;1813.
7. Jin H.J., Shiratani M., Nakatake Y., Fukuzawa T., Kinoshita T., Watanabe Y., Toyofuku M. Jpn J Appl Phys. 38:1999;4492.
8. Jin H.J., Shiratani M., Kawasaki T., Fukuzawa T., Kinoshita T., Watanabe Y., Kawasaki H., Toyofuku M. J Vac Sci Technol A. 17:1999;726.
9. Shiratani M., Jin H.J., Takenaka K., Koga K., Kinoshita T., Watanabe Y. Sci Technol Adv Mater. 2:2001;505.
10. Shiratani M, Jin HJ, Takenaka K, Koga K, Kinoshita T, Watanabe Y. Advanced Metalization Conference 2000, MRS Conference Proceedings Series V-16, Tokyo, Japan 2000, pp. 271-276.
11. Takenaka K, Jin HJ, Koga K, Onishi M, Shiratani M, Watanabe Y. Proceedings of the International Symposium on Dry Process, Tokyo, Japan, 2001, pp. 169-74.
12. Takenaka K, Onishi M, Kinoshita T, Koga K, Shiratani M, Watanabe Y, Shingen T. Proceedings of International Workshop on Informations & Electrical Engineering, Suwon, Korea, 2002, pp. 227-232.