Plasma-enhanced metal organic chemical vapor deposition of high purity copper thin films using plasma reactor with the H atom source

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 3, 1999, Pages 726-730

  Jin, Hong Jie ^a   Shiratani, Masaharu ^a   Kawasaki, Takashi ^a   Fukuzawa, Tsuyoshi ^a   Kinoshita, Toshio ^a   Watanabe, Yukio ^a   Kawasaki, Hiroharu ^b   Toyofuku, Masaharu ^c  

^a KYUSHU UNIVERSITY   (Japan)

^b SASEBO NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

^c FUKUOKA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000832038     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581692     Document Type: Article

References (14)

1. N. Awaya and Y. Arita, Jpn. J. Appl. Phys., Part 1 30, 1813 (1991).
2. B. Zheng, E. T. Einsenbraun, J. Liu, and A. E. Kaloyeros, Appl. Phys. Lett. 61, 2175 (1992).
3. A. E. Kaloyeros and M. A. Fury, Mater. Res. Bull. 18, 22 (1993).
4. W. M. Holber, J. S. Logan, H. J. Grabarz, J. T. C. Yeh, Caughman, J. B. O. A. Sugerman, and F. E. Turene, J. Vac. Sci. Technol. A 11, 2903 (1993).
5. M. Shiratani, K. Shibata, H. Kawasaki, T. Fukuzawa, T. Kinoshita, and Y. Watanabe, Proceedings of the 12th Symposium on Plasma Processing, edited by T. Makabe (Japan Society of Applied Physics, Sendai, 1995), p. 71.
6. M. Shiratani, H. Kawasaki, H. J. Jin, K. Watanabe, T. Kinoshita, T. Fukuzawa, M. Toyofuku, and Y. Watanabe, Proceedings of the 13th Symposium on Plasma Processing, edited by T. Makabe (Japan Society of Applied Physics, Tokyo, 1996), p. 153.
7. M. Shiratani, H. Kawasaki, T. Fukuzawa, T. Kinoshita, and Y. Watanabe, J. Phys. D 29, 2754 (1996).
8. E. T. Eisenbraun, B. Zheng, C. P. Dundon, and P. J. Ding, Appl. Phys. Lett. 60, 3126 (1992).
9. T. Aoki, S. Wickramanayaka, A. M. Wrobel, Y. Nakanishi, and Y. Hatanaka, J. Electrochem. Soc. 142, 166 (1995).
10. W. W. Lee and P. S. Locke, Thin Solid Films 262, 39 (1995).
11. J. Farkas, M. J. Hampden-Smith, and T. T. Kodas, J. Phys. Chem. 98, 6753 (1994).
12. D. W. Trainor, D. C. Ham, and F. Kaufman, J. Chem. Phys. 58, 4599 (1973).
13. P. K. Nune, J. Perrin, J. Guillon, and J. Jolly, Plasma Sources Sci. Technol. 4, 250 (1995).
14. A. D. Tserepi, J. R. Dunlop, B. L. Preppernau, and T. A. Miller, J. Appl. Phys. 72, 2638 (1992).