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Current Applied Physics

Volumn 2, Issue 3, 2002, Pages 205-211

Substrate and pretreatment dependence of Cu nucleation by metal-organic chemical vapor deposition

(4) Kwak, Sung Kwan a Chung, Kwan Soo a Park, Ikmo b Lim, H b

a Kyung Hee University (South Korea)

b Ajou University (South Korea)

Author keywords

Chemical treatments; Copper CVD; Nucleation; Selectivity

Indexed keywords

EID: 0036068704 PISSN: 15671739 EISSN: None Source Type: Journal
DOI: 10.1016/S1567-1739(02)00065-2 Document Type: Article

Times cited : (13)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.