Structural changes of fluorinated amorphous carbon films by nitrogen incorporation

Materials Science in Semiconductor Processing

Volumn 5, Issue 2-3, 2002, Pages 271-277

  Valentini, L ^a   Kenny, J M ^a   Montereali, R M ^c   Lozzi, L ^b   Santucci, S ^b  

^a UNIVERSITY OF PERUGIA   (Italy)

^b UNIVERSITY OF L'AQUILA   (Italy)

^c ENEA   (Italy)

Author keywords

a C:H:F films; Nitrogen incorporation; Optical properties; Temperature Raman Spectroscopy

Indexed keywords

ELLIPSOMETRY; FILM GROWTH; NITROGEN; OPACITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; REFRACTIVE INDEX; STRUCTURE (COMPOSITION); THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

OPTICAL BAND GAPS;

CARBON;

EID: 0036557663     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(02)00104-X     Document Type: Conference Paper

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