SCOPUS 정보 검색 플랫폼

Electrochemical and Solid-State Letters

Volumn 5, Issue 3, 2002, Pages

Effective strategy for porous organosilicate to suppress oxygen ashing damage

(8) Liu, Po Tsun a Chang, T C a,b Mor, Y S c Chen, C W c Tsai, T M c Chu, C J d Pan, F M a Szea, S M a,c

a NATIONAL NANO DEVICE LABORATORIES (Taiwan)

b NATIONAL SUN YAT SEN UNIVERSITY (Taiwan)

c NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

d Nanmat Technology Co Ltd (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

BONDING; DEGRADATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROPHILICITY; MOLECULAR STRUCTURE; PERMITTIVITY; PHOTORESISTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POROUS MATERIALS; REFRACTIVE INDEX; STRENGTH OF MATERIALS; STRIPPING (REMOVAL);

CHEMICAL TRIMETHYLCHLOROSILANE TREATMENT; ORGANOSILICATE GLASSES; OXYGEN PLASMA ASHING; PHOTERESIST STRIPPING;

SILICON COMPOUNDS;

EID: 0036502773 PISSN: 10990062 EISSN: None Source Type: Journal
DOI: 10.1149/1.1445644 Document Type: Article

Times cited : (25)

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