SCOPUS 정보 검색 플랫폼

Electrochemical and Solid-State Letters

Volumn 5, Issue 3, 2002, Pages

Superconformal deposition by surfactant-catalyzed chemical vapor deposition

(3) Josell, D a Wheeler, D a Moffat, T P a

a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; ASPECT RATIO; CATALYSIS; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; CONFORMATIONS; ELECTRODEPOSITION; INTERFACES (MATERIALS); LOW ENERGY ELECTRON DIFFRACTION; MATHEMATICAL MODELS; SCANNING TUNNELING MICROSCOPY; SURFACE ACTIVE AGENTS;

CURVATURE ENHANCED ACCELERATOR COVERAGE MECHANISM; SUPERCONFORMAL DEPOSITION; SURFACTANT CATALYZED CHEMICAL VAPOR DEPOSITION;

COPPER COMPOUNDS;

EID: 0036501962 PISSN: 10990062 EISSN: None Source Type: Journal
DOI: 10.1149/1.1449304 Document Type: Article

Times cited : (29)

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