SCOPUS 정보 검색 플랫폼

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 20, Issue 2, 2002, Pages 413-423

Particle formation during low-pressure chemical vapor deposition from silane and oxygen: Measurement, modeling, and film properties

(8) Kim, T a Suh, S M a Girshick, S L a Zachariah, M R a McMurry, P H a Rassel, R M a Shen, Z a Campbell, S A a

a University of Minnesota (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CORRELATION METHODS; CURRENT VOLTAGE CHARACTERISTICS; MATHEMATICAL MODELS; MORPHOLOGY; NUCLEATION; OXYGEN; PARTICLE SIZE ANALYSIS; PERMITTIVITY; SILANES; TRANSMISSION ELECTRON MICROSCOPY;

LOW-PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD);

THIN FILMS;

EID: 0036495191 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1448506 Document Type: Article

Times cited : (17)

References (46)

1
- 84910955266
- (1992) J. Vac. Sci. Technol. A , vol.10 , pp. 1863
- O'Hanlon, J.E.¹ Parks, H.G.²

2
- 0004245602
- Semiconductor Industry Association, San Jose, CA
- (1999) The International Technology Roadmap for Semiconductors

3
- 0006332448
- Ph.D. thesis, University of Minnesota
- (1999)
- Nijhawan, S.¹

4
- 0003397559
- Oxford University, New York
- (1996) The Science and Engineering of Microelectronic Fabrication
- Campbell, S.A.¹

5
- 0015604073
- (1973) J. Appl. Phys. , vol.44 , pp. 990
- Baliga, B.J.¹ Ghandhi, S.K.²

6
- 0006267120
- unpublished
- (1975) Fifth International Conference on CVD
- Middelhoek, J.¹ Kinkhamer, A.J.²

7
- 0006267121
- unpublished
- (1975) Fifth International Conference on CVD
- Brown, G.W.¹

8
- 84975381597
- (1975) J. Electrochem. Soc. , vol.122 , pp. 155
- Shibata, M.¹ Sugawara, K.²

9
- 0019633414
- (1981) J. Appl. Phys. , vol.52 , pp. 6651
- Maeda, M.¹ Nakamura, H.²

10
- 0020824063
- (1983) J. Electrochem. Soc. , vol.130 , pp. 1888
- Cobianu, C.¹ Pavelescu, C.²

11
- 0020735221
- (1983) Thin Solid Films , vol.102 , pp. 361
- Cobianu, C.¹ Pavelescu, C.²

12
- 0022113162
- (1985) Surf. Coat. Technol. , vol.25 , pp. 307
- Grabiec, P.B.¹ Przyluski, J.²

13
- 0022111041
- (1985) Surf. Coat. Technol. , vol.25 , pp. 315
- Grabiec, P.B.¹ Przyluski, J.²

14
- 0022690282
- (1986) Surf. Coat. Technol. , vol.27 , pp. 219
- Grabiec, P.B.¹ Przyluski, J.²

15
- 0000525881
- J. Chem. Soc. , vol.1935 , pp. 1182
- Emeleus, H.J.¹ Stewart, K.²

16
- 0002904706
- J. Chem. Soc. , vol.1936 , pp. 677
- Emeleus, H.J.¹ Stewart, K.²

17
- 0000629478
- (1968) RCA Rev. , vol.29 , pp. 618
- Strater, K.¹

18
- 0006268110
- unpublished
- (1970) Second International Conference on Chemical Vapor Deposition
- Barry, M.L.¹

19
- 0018157216
- (1978) Thin Solid Films , vol.55 , pp. 221
- Vasilyeva, L.L.¹ Drozdov, V.N.² Repinsky, S.M.³ Svitashev, K.K.⁴

20
- 0002091808
- (1981) Thin Solid Films , vol.76 , pp. 61
- Vasiliev, Y.V.¹ Vasilieva, L.L.² Drozdov, V.N.³ Shklyaev, A.A.⁴

21
- 0018531344
- (1979) J. Electrochem. Soc. , vol.126 , pp. 1728
- Taft, E.A.¹

22
- 0037944939
- (1988) Chem. Phys. Lett. , vol.151 , pp. 33
- Van de Weijer, P.¹ Zwerver, B.H.² Suijker, J.L.G.³

23
- 0024701240
- (1989) J. Mater. Res. , vol.4 , pp. 863
- Ellis F.B., Jr.¹ Houghton, J.²

24
- 0025419656
- (1990) J. Electrochem. Soc. , vol.137 , pp. 1222
- Watanabe, K.¹ Komiyama, H.²

25
- 0026121858
- (1991) Jpn. J. Appl. Phys., Part 1 , vol.30 , pp. 431
- Kawahara, T.¹ Yuuki, A.² Matsui, Y.³

26
- 0030126951
- (1996) J. Electrochem. Soc. , vol.143 , pp. 1355
- Takahashi, T.¹ Hagiwara, K.² Egashira, Y.³ Komiyama, H.⁴

27
- 0032141705
- (1998) J. Mater. Res. , vol.13 , pp. 2308
- Ojeda, F.¹ Castro-Garcia, A.² Gomez-Aleixandre, C.³ Albella, J.M.⁴

28
- 0017557751
- (1977) J. Electrochem. Soc. , vol.124 , pp. 1771
- Shintani, A.¹ Suda, K.² Suzuki, M.³ Maki, M.⁴ Takami, K.⁵

29
- 0018984839
- (1980) J. Electrochem. Soc. , vol.127 , pp. 426
- Shintani, A.¹ Suda, K.² Maki, M.³

30
- 0001300002
- (1992) Appl. Phys. Lett. , vol.60 , pp. 198
- Liehr, M.¹ Cohen, S.A.²

31
- 0030263611
- (1996) J. Electrochem. Soc. , vol.143 , pp. 3397
- Whitby, E.¹ Hoshino, M.²

32
- 0000012587
- (1995) Rev. Sci. Instrum. , vol.66 , pp. 3955
- Whitby, E.¹ Hoshino, M.²

33
- 36449001969
- (1994) Rev. Sci. Instrum , vol.65 , pp. 140
- Hargis P.J., Jr.¹

34
- 0001364938
- (1995) J. Aerosol Sci. , vol.26 , pp. 745
- Ziemann, P.J.¹ Liu, P.² Rao, N.P.³ Kettelson, D.B.⁴ McMurry, P.H.⁵

35
- 0029278226
- (1995) Aerosol. Sci. Technol. , vol.22 , pp. 293
- Liu, P.¹ Ziemann, P.J.² Kittelson, D.B.³ McMurry, P.H.⁴

36
- 0029278150
- (1995) Aerosol. Sci. Technol. , vol.22 , pp. 314
- Liu, P.¹ Ziemann, P.J.² Kittelson, D.B.³ McMurry, P.H.⁴

37
- 0000475191
- (1995) J. Phys. Chem. , vol.99 , pp. 5126
- Ziemann, P.J.¹ Liu, P.² Kettelson, D.B.³ McMurry, P.H.⁴

38
- 0025597730
- (1990) Vacuum , vol.7-9 , pp. 2142
- Lieszkovszky, L.¹ Filippelli, A.R.²

39
- 0023329575
- (1987) Combust. Flame , vol.68 , pp. 43
- Hartman, J.R.¹ Famil-Ghiriha, J.² Ring, M.A.³ O'Neal, H.E.⁴

40
- 0003686234
- McGraw-Hill, New York
- (1996) An Introduction to Combustion: Concepts and Applications
- Turns, S.R.¹

41
- 0030106532
- (1996) J. Vac. Sci. Technol. A , vol.14 , pp. 582
- McMurry, P.H.¹ Nijhawan, S.² Rao, N.³ Ziemann, P.⁴ Kittelson, D.B.⁵ Campbell, S.⁶

42
- 0035334446
- (2001) J. Vac. Sci. Technol. A , vol.19 , pp. 940
- Suh, S.-M.¹ Zachariah, M.R.² Girshick, S.L.³

43
- 0006304533
- submitted for proceedings volume
- (2001) Second International Symposium on Fundamental Gas-Phase and Surface Chemistry of Vapor-Phase Deposition
- Suh, S.-M.¹ Girshick, S.² Zachariah, M.³

44
- 0034272602
- (2000) J. Vac. Sci. Technol. A , vol.18 , pp. 2198
- Nijhawan, S.¹ McMurry, P.H.² Campbell, S.A.³

45
- 0020834903
- (1983) J. Appl. Phys. , vol.54 , pp. 5801
- DiMaria, D.J.¹ Dong, D.W.² Falcony, C.³ Theis, T.N.⁴ Kirtley, J.C.⁵ Tsang, J.C.⁶ Brorson, S.D.⁷

46
- 0032676703
- (1999) Nanotechnology , vol.10 , pp. 127
- Maeda, T.¹ Suzuki, E.² Sakata, I.³ Yamanaka, M.⁴ Ishii, K.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.