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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 3, 2001, Pages 940-951

Modeling particle formation during low-pressure silane oxidation: Detailed chemical kinetics and aerosol dynamics

(3) Suh, S M a Zachariah, M R a Girshick, S L a

a UNIVERSITY OF MINNESOTA (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AEROSOLS; COAGULATION; FILM GROWTH; MATHEMATICAL MODELS; MOLECULAR DYNAMICS; NUCLEATION; OXIDATION; PRESSURE EFFECTS; REACTION KINETICS; SURFACE REACTIONS; THERMAL EFFECTS; VAN DER WAALS FORCES;

AEROSOL DYNAMICS; SILICON DIOXIDE CLUSTERS;

SILANES;

EID: 0035334446 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1355757 Document Type: Article

Times cited : (34)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.