Particle size distribution in a low pressure SiH4:O2:He chemical vapor deposition reactor. Experimental and numerical results

Journal of the Electrochemical Society

Volumn 143, Issue 10, 1996, Pages 3397-3404

  Whitby, Evan ^a   Hoshino, Masakazu ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; NUCLEATION; SEMICONDUCTOR DEVICE MODELS; SEMICONDUCTOR GROWTH; SILICON WAFERS;

AEROSOL SIZE DISTRIBUTION; PARTICLE FORMATION RATES;

PARTICLE SIZE ANALYSIS;

EID: 0030263611     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837219     Document Type: Article

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