Growth kinetics of chemically vapor deposited SiO2 films from silane oxidation

Journal of Materials Research

Volumn 13, Issue 8, 1998, Pages 2308-2314

  Ojeda, Fernando ^a   Castro García, Alejandro ^a   Gómez Aleixandre, Cristina ^a   Albella, José María ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FILM GROWTH; NITROGEN; OXIDATION; OXYGEN; SEMICONDUCTING SILICON COMPOUNDS; SILANES; SILICA;

THIN FILMS;

EID: 0032141705     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1998.0322     Document Type: Article

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