Particle beam mass spectrometer measurements of particle formation during low pressure chemical vapor deposition of polysilicon and SiO2 films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 2, 1996, Pages 582-587

  McMurry, Peter H ^a   Nijhawan, Sandeep ^a   Rao, Nagaraja ^a   Ziemann, Paul ^a   Kittelson, David B ^a   Campbell, Stephen ^b  

^a University of Minnesota   (United States)

^b UNIVERSITY OF MINNESOTA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; GROWTH (MATERIALS); MASS SPECTROMETERS; NUCLEATION; PARTICLE BEAMS; PARTICLE SIZE ANALYSIS; PARTICLES (PARTICULATE MATTER); PERFORMANCE; SILICA; SILICON;

LOW PRESSURE CHEMICAL VAPOR DEPOSITION; PARTICLE FORMATION; PARTICLE GROWTH; POLYSILICON;

MASS SPECTROMETRY;

EID: 0030106532     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580149     Document Type: Article

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