Direct current bias effects in RF induction thermal plasma diamond CVD

IEEE Transactions on Plasma Science

Volumn 30, Issue 1 III, 2002, Pages 442-449

  Berghaus, Jörg Oberste ^b   Meunier, Jean Luc ^a,b   Gitzhofer, François ^c  

^a IEEE   (Canada)

^b MCGILL UNIVERSITY   (Canada)

^c UNIVERSITÉ DE SHERBROOKE   (Canada)

Author keywords

Chemical vapor deposition; Diamond film; Electron emission; RF thermal plasma; Substrate bias

Indexed keywords

DIRECT CURRENT BIAS;

DIAMOND FILMS; ELECTRIC FILTERS; ELECTRON EMISSION; EMISSION SPECTROSCOPY; FILM GROWTH; ION BOMBARDMENT; NUCLEATION; RADIO INTERFERENCE; SUBSTRATES;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 0036478260     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2002.1003894     Document Type: Article

References (35)

1. Generation of diamond nuclei by electric fields in plasma chemical vapor deposition
2. On the mechanisms of bias enhanced nucleation of diamond
3. Evidence of an energetic ion bombardment mechanism from bias-enhanced nucleation of diamond
4. Investigation of bias enhanced nucleation of diamond on silicon
5. Investigation of the nucleation mechanism in bias-enhanced diamond deposition
6. Electron-emission-enhanced diamond nucleation on Si by hot filament chemical vapor deposition
7. Epitaxial nucleation of diamond on β-SiC via bias-enhanced microwave plasma chemical vapor deposition
8. Substrate bias effect in diamond deposition by dc plasma jet
9. Purification of diamond films by applying current into the plasma stream in the arc discharge plasma jet chemical vapor deposition technique
10. Experimental investigation of atmospheric pressure nonequilibrium plasma chemistry
11. Increased deposition rate of chemically vapor deposited diamond in a direct-current arcjet with a secondary discharge
12. Local growth studies of CVD diamond using a probe-like substrate
13. 2 gas system
14. Control of substrate temperature during diamond deposition
15. Investigation of an RF plasma with symmetrical and asymmetrical electrostatic probes
16. A tuned Langmuir probe for measurements in RF glow discharges
17. Spectroscopic diagnostics: Basic concepts
18. Growth rate studies of CVD diamond in an RF plasma torch
19. Hydrogen/argon plasma jet with methane addition
20. Direct-current bias effect on the synthesis of (001) textured diamond films on silicon
21. Epitaxy of diamond on silicon
22. Energy distribution of field emitted electrons from diamond coated molybdenum tips
23. Inflection-point method of interpreting emissive probe characteristics
24. Determination of positive-ion mobilities and collision cross sections in flame gases using electrostatic probes
25. Electric probes
26. A multi-fluid stagnation-flow plasma model with self-consistent treatment of the collisional sheath
27. The use of Langmuir probes in the study of high pressure plasmas
28. Stagnation probe measurements in flowing plasmas
29. Process study of thermal plasma chemical vapor deposition of diamond Part I: Substrate material, temperature, and methane concentration
30. Fluid boundary layer effects in atmospheric-pressure plasma diamond film deposition
31. Growth of diamond on silicon during the bias pretreatment in chemical vapor deposition of polycrystalline diamond films
32. Synthesis of oriented textured diamond films on silicon via hot filament chemical vapor deposition
33. Effect of amorphous carbon film structure on diamond nucleation