Microscopic characterization of microcrystalline silicon thin films

Thin Solid Films

Volumn 276, Issue 1-2, 1996, Pages 314-317

  Sieber, I ^a   Urban, I ^b   Dorfel I ^b   Koynov, S ^c   Schwarz, R ^c   Schmidt, M ^a  

^a HAHN MEITNER INSTITUT   (Germany)

^b BAM FEDERAL INSTITUTE FOR MATERIALS RESEARCH AND TESTING   (Germany)

^c TECHNICAL UNIVERSITY OF MUNICH   (Germany)

Author keywords

Chemical vapour deposition; Electron microscopy; Silicon; Structural properties

Indexed keywords

AMORPHOUS SILICON; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; FILM PREPARATION; GRAIN SIZE AND SHAPE; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

MICROCRYSTALLINE SILICON THIN FILMS;

THIN FILMS;

EID: 0030122954     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)08106-2     Document Type: Article

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