Growth and characterization of hillock-free high quality homoepitaxial diamond films

Diamond and Related Materials

Volumn 9, Issue 9, 2000, Pages 1650-1654

  Wang, Chunlei ^a   Irie, Masatake ^a   Ito, Toshimichi ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CATHODOLUMINESCENCE; CHEMICAL VAPOR DEPOSITION; EPITAXIAL GROWTH; MORPHOLOGY; ROUGHNESS MEASUREMENT; SURFACES; SYNTHESIS (CHEMICAL); THERMAL EFFECTS;

BAND EDGE EMISSION; GROWTH HILLOCKS; HOMOEPITAXIAL DIAMOND FILMS; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION;

DIAMOND FILMS;

EID: 0034274760     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(00)00295-8     Document Type: Article

References (12)

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