GaN diffractive microlenses fabricated with gray-level mask

Optics Communications

Volumn 215, Issue 1-3, 2002, Pages 75-78

  Chen, Chii Chang ^a   Li, Ming Hung ^a   Chang, Chih Yang ^a   Sheu, Jinn Kong ^a   Chi, Gou Chung ^a   Cheng, Wei Tai ^b   Yeh, Jui Hung ^b   Chang, Jenq Yang ^a   Ito, Toshiaki ^c  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^b Nano Architect Research Corporation   (Taiwan)

^c NICHIA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION; GALLIUM NITRIDE; MASKS; OPTICAL DATA STORAGE; PLASMA ETCHING; SEMICONDUCTOR LASERS; ULTRAVIOLET RADIATION;

DIFFRACTIVE MICROLENSES;

MICROLENSES;

EID: 0036460815     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0030-4018(02)02198-3     Document Type: Article

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