Optical Recording Using High Numerical-Aperture Microlens by Plasma Etching

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 40, Issue 3 B, 2001, Pages 1792-1793

  Kouchiyama, Akira ^a   Ichimura, Isao ^a   Kishima, Koichiro ^a   Nakao, Takashi ^a   Yamamoto, Kenji ^a   Hashimoto, Gakuji ^a   Iida, Atsushi ^a   Osato, Kiyoshi ^a  

^a SONY CORPORATION   (Japan)

Author keywords

High numerical aperture; Microlens; Optical recording; Plasma etching

Indexed keywords

CHUCKS; FABRICATION; HEAT EXCHANGERS; OPTICAL RECORDING; PHOTORESISTS; PLASMA ETCHING; SCANNING ELECTRON MICROSCOPY;

NEUTRAL LOOP DISCHARGE (NLD);

MICROLENSES;

EID: 0035267475     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.1792     Document Type: Article

References (2)

1. H. Tsuboi, M. Itoh, T. Tanabe, T. Hayashi and T. Uchida: Jpn. J. Appl. Phys. 34 (1995) 2476.
2. I. Ichimura, F. Maeda, K. Osato, K. Yamamoto and Y. Kasami: Jpn. J. Appl. Phys. 39 (2000) 937.