Ellipsometric study of the change in the porosity of silica xerogels after chemical modification of the surface with hexamethyldisilazane

Analytical and Bioanalytical Chemistry

Volumn 374, Issue 4, 2002, Pages 654-657

  Himcinschi, C ^a   Friedrich, M ^a   Fruhauf S ^a   Streiter, I ^a   Schulz, S E ^a   Gessner, T ^a   Baklanov, M R ^b   Mogilnikov, K P ^b   Zahn, D R T ^a  

^a CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

^b IMEC   (Belgium)

Author keywords

Ellipsometry; Low k dielectric; Xerogel

Indexed keywords

CONDENSATION; ELLIPSOMETRY; POROSITY; THIN FILMS;

SURFACE GROUPS;

SILICA;

ALKANE DERIVATIVE; HEXAMETHYLDISILAZANE; METHYL GROUP; SILICON DIOXIDE; UNCLASSIFIED DRUG;

CHEMICAL MODIFICATION; CONFERENCE PAPER; ELLIPSOMETRY; GEL; POROSITY; SURFACE PROPERTY;

EID: 0036460401     PISSN: 16182642     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00216-002-1392-x     Document Type: Conference Paper

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