Feasibility study of an embedded transparent phase-shifting mask in ArF lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000 (I), Issue , 2000, Pages 443-451

  Matsuo, Takahiro ^a   Ogawa, Tohru ^a   Morimoto, Hiroaki ^a  

^a NeTech Inc   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE; MASKS; PHASE SHIFT;

OFF AXIS ILLUMINATION; RESOLUTION ENHANCEMENT TECHNOLOGY; TRANSPARENT PHASE SHIFTING MASKS (PSM);

PHOTOLITHOGRAPHY;

EID: 0033720383     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.389033     Document Type: Conference Paper

References (9)