A novel optical lithography technique using the phase-shifter fringe

Japanese Journal of Applied Physics

Volumn 30, Issue 5 R, 1991, Pages 1131-1136

  Tanaka, Toshihiko ^a,b   Uchino, Shouichi ^a,b   Hasegawa, Norio ^a,b   Yamanaka, Toshiaki ^a,b   Terasawa, Tsuneo ^a,b   Okazaki, Shinji ^a,b  

^a HITACHI LTD   (Japan)

^b Society of Applied Physics ^*  (Japan)

Author keywords

Exposure; Focus latitude; I line; Lithography; Negative resist; Optical lithography; OPTIMA; Phase shifter; Phase shifting lithography; Resolution

Indexed keywords

OPTICAL PROPERTIES - ANALYSIS;

OUTLINE PATTERN TRANSFER IMAGING (OPTIMA);

LITHOGRAPHY;

EID: 0026157687     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.30.1131     Document Type: Article

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