Heteroepitaxial diamond thin film growth on Ir(001)/MgO(001) substrate by antenna-edge plasma assisted chemical vapor deposition (St. Elmo CVD)

New Diamond and Frontier Carbon Technology

Volumn 12, Issue 6, 2002, Pages 333-341

  Tachiki, Minoru ^a   Fujisaki, Toyokatsu ^a   Taniyama, Norikazu ^b   Kudo, Minoru ^b   Kawarada, Hiroshi ^a  

^a WASEDA UNIVERSITY   (Japan)

^b Micro Denshi Co Ltd   (Japan)

Author keywords

Antenna edge; Chemical vapor deposition; Diamond; Heteroepitaxial growth; Iridium

Indexed keywords

DIAMOND FILMS; EPITAXIAL GROWTH; HIGH ENERGY ELECTRON DIFFRACTION; NUCLEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SURFACE ROUGHNESS;

EPITAXIAL NUCLEATION;

THIN FILMS;

EID: 0036448524     PISSN: 13449931     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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