Fabrication of epitaxial diamond thin film on iridium

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 36, Issue 9 A/B, 1997, Pages

  Ohtsuka, Kazuki ^a   Fukuda, Hideo ^a   Suzuki, Kazuhiro ^b   Sawabe, Atsuhito ^a  

^a AOYAMA GAKUIN UNIVERSITY   (Japan)

^b To plas Corporation   (Japan)

Author keywords

Chemical vapor deposition; Diamond; Diamond thin film; Direct current; Epitaxial growth; Epitaxy; Iridium; Raman spectroscopy

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CRYSTAL ORIENTATION; ELECTRIC CURRENTS; EPITAXIAL GROWTH; INTERFACES (MATERIALS); ION BOMBARDMENT; IRIDIUM; PLASMA APPLICATIONS; RAMAN SPECTROSCOPY; SURFACE ROUGHNESS; THIN FILMS;

DIRECT CURRENT PLASMA CHEMICAL VAPOR DEPOSITION;

DIAMOND FILMS;

EID: 0031221605     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.l1214     Document Type: Article

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