Diamond deposition on a large-area substrate by plasma-assisted chemical vapor deposition using an antenna-type coaxial microwave plasma generator

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 40, Issue 7 A, 2001, Pages

  Taniyama, Norikazu ^a   Kudo, Minoru ^a   Matsumoto, Osamu ^b   Kawarada, Hiroshi ^c  

^a Micro Denshi Co Ltd   (Japan)

^b AOYAMA GAKUIN UNIVERSITY   (Japan)

^c WASEDA UNIVERSITY   (Japan)

Author keywords

ACMPG; Coaxial cable; CVD; Deposition; Diamond; Electrode; Heated substrate; Large area; Microwave; Plasma

Indexed keywords

COAXIAL CABLES; COMPUTER SIMULATION; DIAMONDS; ELECTRODES; METHANE; MICROWAVE ANTENNAS; NUMERICAL ANALYSIS; OPTICAL MICROSCOPY; PLASMAS; RAMAN SCATTERING; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SUBSTRATES;

ANTENNA-TYPE COAXIAL MICROWAVE PLASMA GENERATORS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 0035389211     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.l698     Document Type: Article

References (5)