Dry etching of photonic crystals in InP based materials

Physica Scripta T

Volumn 101, Issue , 2002, Pages 106-109

  Mulot, M ^a   Anand, S ^a   Carlstrom C F ^a   Swillo, M ^a   Talneau, A ^b  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; DRY ETCHING; ION BEAMS; OPTIMIZATION; PHOTONS; REACTIVE ION ETCHING;

CHEMICALLY ASSISTED ION BEAM ETCHING (CAIBE);

SEMICONDUCTING INDIUM PHOSPHIDE;

EID: 0036441713     PISSN: 02811847     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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