High-aspect-ratio nanophotonic components fabricated by Cl2 reactive ion beam etching

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 2740-2744

  Zubrzycki, W J ^a   Vawter, G A ^a   Wendt, J R ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040114968     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (12)

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