Low loss InP-based photonic crystal waveguides etched with Ar/Cl2 chemically assisted ion beam etching

European Conference on Optical Communication, ECOC

Volumn 6, Issue , 2001, Pages 32-33

  Mulot, M ^a   Anand, S ^a   Swillo, M ^a   Qiu, M ^a   Jaskorzynska, B ^a   Talneau, A ^a  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; COMPUTER SIMULATION; CRYSTALS; DRY ETCHING; FINITE DIFFERENCE METHOD; HETEROJUNCTIONS; ION BEAMS; OPTICAL FIBER FABRICATION; PHOTONS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING INDIUM PHOSPHIDE; TIME DOMAIN ANALYSIS;

PHOTONIC CRYSTAL (PC) WAVEGUIDES;

OPTICAL WAVEGUIDES;

EID: 0035741396     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)

1. Dry etching of photonie crystals in InP based materials
2. Characterization and modeling of InP/GalnAsP photonie-crystal waveguides
3. Numerical studies of mode-gaps and incoupling efficiency for line-defect waveguides in twodimensional photonic crystals
4. Mini-stopbands of a one dimensional system: The channel waveguide in a two-dimensional photonic crystal