Mask error tensor and causality of mask error enhancement for low-k1 imaging: Theory and experiments

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 I, Issue , 2002, Pages 247-258

  Chen, Chun Kuang ^a   Gau, Tsai Sheng ^a   Shin, Jaw Jung ^a   Liu, Ru Gun ^a   Yu, Shinn Sheng ^a   Yen, Anthony ^a   Lin, Burn J ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

Mask error enhancement factor; Mask error factor; Masks; Optical lithography

Indexed keywords

AERIAL PHOTOGRAPHY; ERROR ANALYSIS; IMAGE ANALYSIS; IMAGING SYSTEMS; MASKS;

MASK ERROR ENHANCEMENT FACTORS (MEEF);

PHOTOLITHOGRAPHY;

EID: 0036416071     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474574     Document Type: Conference Paper

References (8)

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