Mask technology for EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3665, Issue , 1999, Pages 30-39

  Bujak, M ^a   Burkhart, S ^a   Cerjan, C ^a   Kearney, P ^a   Moore, C ^a   Prisbrey, S ^a   Sweeney, D ^a   Tong, W ^a   Vernon, S ^a   Walton, C ^a   Warrick, A ^a   Weber, F ^a   Wedowski, M ^a   Wilhelmsen, K ^a   Bokor, J ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

INTEGRATED CIRCUIT MANUFACTURE; LIGHT ABSORPTION; LIGHT REFLECTION; MASKS; REACTIVE ION ETCHING; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS; ULTRAVIOLET RADIATION;

PHOTOLITHOGRAPHY;

EID: 0032593592     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (24)