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Journal of Photopolymer Science and Technology

Volumn 15, Issue 4, 2002, Pages 619-624

Study of PAG size effect on lithographic performance of 157nm resists

(3) Hanawa, Ryotaro a Hashimoto, Kazuhiko a Uetani, Yasunori a

a SUMITOMO CHEMICAL CO LTD (Japan)

Author keywords

157 nm Resists; Anion size of TPS type PAG; Chemically amplified resists; Protected polynorbornane polymer

Indexed keywords

POLYMER;

ANALYTIC METHOD; ARTICLE; CHEMICAL ANALYSIS; LITHOGRAPHY; MATERIALS; MATERIALS TESTING; SYNTHESIS; ULTRAVIOLET SPECTROSCOPY; VACUUM;

EID: 0036363142 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.15.619 Document Type: Article

Times cited : (4)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.