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Volumn 402, Issue , 1996, Pages 283-294
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Selective titanium silicide for industrial applications
a
a
ORANGE LABS
(France)
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
ELECTRIC CONDUCTIVITY;
ELECTRIC CONTACTS;
ELECTRIC RESISTANCE;
EPITAXIAL GROWTH;
GRAIN SIZE AND SHAPE;
INDUSTRIAL APPLICATIONS;
INTEGRATED CIRCUITS;
PHASE TRANSITIONS;
SEMICONDUCTOR DOPING;
STOICHIOMETRY;
DEWETTABILITY;
SALICIDE TECHNIQUE;
STANDARD SOLID PHASE REACTION TECHNIQUE;
TITANIUM SILICIDE;
TITANIUM COMPOUNDS;
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EID: 0029771149
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
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Times cited : (10)
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References (30)
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