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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 1, 2002, Pages 263-270

Effects of deposition temperature on the conduction mechanisms and reliability of radio frequency sputtered TiO2 thin films

(2) Chen, Shih Fang a Wang, Ching Wu a

a I SHOU UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC BREAKDOWN; ELECTRIC CONDUCTANCE; GATES (TRANSISTOR); LEAKAGE CURRENTS; MOS CAPACITORS; PERMITTIVITY; SPUTTER DEPOSITION; TITANIUM OXIDES; X RAY DIFFRACTION ANALYSIS;

RADIO FREQUENCY SPUTTERING;

THIN FILMS;

EID: 0036124618 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.1434971 Document Type: Conference Paper

Times cited : (9)

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