Optimization of dipole off-axis illumination by 1st-order efficiency method for sub-120 nm node with KrF lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 12 B, 2000, Pages 6777-6780

  Kim, Seo Min ^a   Kim, Sang Jin ^a   Bang, Chang Jin ^a   Ham, Young Mog ^a   Baik, Ki Ho ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

110 nm devices; 1st order efficiency; Dipole OAI; KrF lithography

Indexed keywords

OPTICAL DESIGN; OPTIMIZATION; QUANTUM EFFICIENCY;

OPTICAL PROXIMITY CORRECTION (OPC);

PHOTOLITHOGRAPHY;

EID: 0034430579     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.6777     Document Type: Article

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