Design and development of high performance 193 nm positive resist based on functionalized poly(cyclicolefins)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue I, 1999, Pages 51-62

  Rao Varanasi, P ^a   Maniscalco, J ^a   Mewherter, A M ^a   Lawson, M C ^a   Jordhamo, G ^a   Allen, R ^a   Opitz, J ^a   Ito, H ^a   Wallow, T ^a   Hofer, D ^a   Langsdorf, L ^a   Jayaraman, S ^a   Vicari, R ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COPOLYMERS; POLYACRYLATES; REACTIVE ION ETCHING;

POLYCYCLICOLEFINS;

PHOTORESISTS;

EID: 0032663969     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (5)