W-CMP alignment using ASML’s ATHENA system on an I-line stepper

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4344, Issue 1, 2001, Pages 79-88

  Prasad, K John ^a   Rajan, D Arunagiri ^a   Kong, Tan Yew ^a   Sun, Gin Ping ^a   Morgan, Stephen ^b   Phillips, Merritt ^b   Ng, Bruce ^c  

^a CHARTERED SEMICONDUCTOR MANUFACTURING LTD   (Singapore)

^b ASML   (Netherlands)

^c Hermes Epitek   (Singapore)

Author keywords

ATHENA; W CMP Alignment

Indexed keywords

ALIGNMENT; DIFFRACTION GRATINGS; ETCHING; SAMPLING;

PHASE GRATING ALIGNMENT (PGA) SYSTEMS;

CHEMICAL MECHANICAL POLISHING;

EID: 0034763496     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436730     Document Type: Article

References (3)

1. Effect of processing on the overlay performance of a wafer stepper
2. Overlay performance in advanced processes
3. Improved wafer stepper alignment performance using an enhanced phase grating alignment system