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International Journal of Refractory Metals and Hard Materials

Volumn 20, Issue 2, 2002, Pages 129-134

Low-pressure c-BN deposition - Is a CVD process possible?

(2) Haubner, Roland a Tang, Xinhe a

a VIENNA UNIVERSITY OF TECHNOLOGY (Austria)

Author keywords

c BN; Chemical vapor deposition (CVD); Physical vapor deposition (PVD)

Indexed keywords

CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; COATINGS; CRYSTALLIZATION; INFRARED SPECTROSCOPY; NITROGEN; PHYSICAL VAPOR DEPOSITION; PRESSURE EFFECTS; SECONDARY ION MASS SPECTROMETRY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

BORON NITROGEN (BN) LAYERS;

CUBIC BORON NITRIDE;

EID: 0036016404 PISSN: 02634368 EISSN: None Source Type: Journal
DOI: 10.1016/S0263-4368(02)00011-2 Document Type: Conference Paper

Times cited : (2)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.