Effects of Co precipitation on Si diffusion in Ag(Co)/Si during postannealing

Journal of the Korean Physical Society

Volumn 41, Issue 4, 2002, Pages 417-421

  Hong, S J ^a   Yang, H J ^a   Kim, J Y ^a   Shin, H J ^a   Lee, J H ^a   Ko, Y K ^a   Lee, J G ^a   Kang, B J ^b   Cho, B S ^b   Jeong, C O ^b   Chung, K H ^b   Lee, C M ^c  

^a Kookmin University   (South Korea)

^b SAMSUNG Electronics   (South Korea)

^c Inha University   (South Korea)

Author keywords

Alloy; Diffusion; Metallization; Silver

Indexed keywords

EID: 0035981399     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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