Anisotropic etching of silicon in a complexant redox alkaline system

Sensors and Actuators, B: Chemical

Volumn 58, Issue 1-3, 1999, Pages 438-449

  Moldovan, Carmen ^a   Iosub, Rodica ^a   Dascalu, Dan ^a   Nechifor, Gheorghe ^b  

^a NATIONAL INSTITUTE FOR RESEARCH AND DEVELOPMENT IN MICROTECHNOLOGIES   (Romania)

^b UNIVERSITY POLITEHNICA OF BUCHAREST   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

ALKALINITY; ANISOTROPY; CHEMICAL ANALYSIS; ETCHING; POTASSIUM COMPOUNDS; REDOX REACTIONS; SURFACE ROUGHNESS;

ANISOTROPIC ETCHING; COMPLEXANT REDOX ALKALINE SYSTEM; ORGANIC COMPLEXANTS;

SILICON SENSORS;

EID: 0342757614     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(99)00124-0     Document Type: Article

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